Effect of high-frequency and low-frequency power of ICP/CCP C4F8/Ar plasma on the textured structure of AZO films

Effect of high-frequency and low-frequency power of ICP/CCP C4F8/Ar plasma on the textured structure of AZO films

WU Ming-zhi;JIN Cheng-gang;WANG Fei;HUANG Tian-yuan;WU Xue-mei;ZHUGE Lan-jian

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Jorunal of Functional Materials ›› 2013, Vol. 44 ›› Issue (05) : 744-747.

工艺 ·技术

Effect of high-frequency and low-frequency power of ICP/CCP C4F8/Ar plasma on the textured structure of AZO films

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