Study of planarization efficiency of an alkaline copper slurry on 300mm pattern wafer CMP

Study of planarization efficiency of an alkaline copper slurry on 300mm pattern wafer CMP

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Journal of Functional Materials ›› 2012, Vol. 43 ›› Issue (24) : 20-0.

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Study of planarization efficiency of an alkaline copper slurry on 300mm pattern wafer CMP

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