Effects of pulse width on the structure and properties of MoS<sub>2</sub> films deposited by pulse magnetron sputtering

doi:10.3969/j.issn.1001-9731.2023.03.027

Jorunal of Functional Materials ›› 2023, Vol. 54 ›› Issue (3) : 3187-3193. DOI: 10.3969/j.issn.1001-9731.2023.03.027

Process & Technology

Effects of pulse width on the structure and properties of MoS₂ films deposited by pulse magnetron sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2023, 54(3): 3187-3193 https://doi.org/10.3969/j.issn.1001-9731.2023.03.027

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Received	Revised	Published
2022-08-12	2022-11-10	2023-03-30
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2023-03-31

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