Preparation of largescale smooth TiN thin film electrode with ultra low resistivity by magnetron sputtering

doi:10.3969/j.issn.1001-9731.2021.07.003

Journal of Functional Materials ›› 2021, Vol. 52 ›› Issue (7) : 7012-7017. DOI: 10.3969/j.issn.1001-9731.2021.07.003

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Preparation of largescale smooth TiN thin film electrode with ultra low resistivity by magnetron sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2021, 52(7): 7012-7017 https://doi.org/10.3969/j.issn.1001-9731.2021.07.003

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Received	Revised	Published
2021-01-15	2021-04-28	2021-07-30
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2021-07-30

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