Effect of background vacuum on the morphology of higher manganese silicide prepared by magnetron sputtering

doi:10.3969/j.issn.1001-9731.2020.08.029

Jorunal of Functional Materials ›› 2020, Vol. 51 ›› Issue (8) : 8183-8188. DOI: 10.3969/j.issn.1001-9731.2020.08.029

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Effect of background vacuum on the morphology of higher manganese silicide prepared by magnetron sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2020, 51(8): 8183-8188 https://doi.org/10.3969/j.issn.1001-9731.2020.08.029

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2020-02-18	2020-08-30
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2020-08-30

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