Study on RF magnetron sputtering deposition and impedance characterization of doped BST thin films

doi:10.3969/j.issn.1001-9731.2019.04.021

Journal of Functional Materials ›› 2019, Vol. 50 ›› Issue (4) : 4126-4129. DOI: 10.3969/j.issn.1001-9731.2019.04.021

Research & Development

Study on RF magnetron sputtering deposition and impedance characterization of doped BST thin films

{{article.zuoZhe_EN}}

Author information +

History +

HeighLight

Abstract

Key words

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations

{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2019, 50(4): 4126-4129 https://doi.org/10.3969/j.issn.1001-9731.2019.04.021

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

Funding

RIGHTS & PERMISSIONS

PDF(3049 KB)

Accesses

Citation

Detail

Sections

Recommended

Received	Published
2018-12-10	2019-04-30
Issue Date
2019-04-30

Please choose a citation manager

Content to export

HeighLight

Abstract

Key words

Cite this article

{{custom_sec.title}}

{{custom_sec.title}}

References

References

{{custom_fnGroup.title_en}}

Footnotes

{{custom_ack.title_en}}

Funding

RIGHTS & PERMISSIONS