Effect of sintering pressure on the nodulation of high performance TFT ITO target

doi:10.3969/j.issn.1001-9731.2018.08.009

Journal of Functional Materials ›› 2018, Vol. 49 ›› Issue (8) : 8057-8061. DOI: 10.3969/j.issn.1001-9731.2018.08.009

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Effect of sintering pressure on the nodulation of high performance TFT ITO target

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2018, 49(8): 8057-8061 https://doi.org/10.3969/j.issn.1001-9731.2018.08.009

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2018-03-14	2018-08-30
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2018-08-30

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