Study on the mechanism of preparation of silicon based germanium thin films by rapid thermal

doi:10.3969/j.issn.1001-9731.2018.04.033

Jorunal of Functional Materials ›› 2018, Vol. 49 ›› Issue (4) : 4179-4183. DOI: 10.3969/j.issn.1001-9731.2018.04.033

Process & Technology

Study on the mechanism of preparation of silicon based germanium thin films by rapid thermal

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2018, 49(4): 4179-4183 https://doi.org/10.3969/j.issn.1001-9731.2018.04.033

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2017-10-20	2018-04-30
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2018-04-30

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