Effects of Ar pressure on the morphology, structure and electrical properties of CdZnTe film deposited by magnetron sputtering

doi:10.3969/j.issn.1001-9731.2018.04.023

XI Shouzhi, JIE Wanqi, WANG Tao, ZHA Gangqiang, WANG Aoqiu, YU Hui, XU Lingyan, ZHANG Hao, YANG Fan, ZHOU Boru, XU Yadong, GU Yaxu

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Jorunal of Functional Materials ›› 2018, Vol. 49 ›› Issue (4) : 4128-4133. DOI: 10.3969/j.issn.1001-9731.2018.04.023

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Effects of Ar pressure on the morphology, structure and electrical properties of CdZnTe film deposited by magnetron sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2018, 49(4): 4128-4133 https://doi.org/10.3969/j.issn.1001-9731.2018.04.023

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2017-11-21	2018-04-30
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2018-04-30

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