Effect of target current density on the structure and property of the Cr<sub>2</sub>N films deposited by hot wire plasma enhanced magnetron sputtering

doi:10.3969/j.issn.1001-9731.2018.03.010

Journal of Functional Materials ›› 2018, Vol. 49 ›› Issue (3) : 3070-3075. DOI: 10.3969/j.issn.1001-9731.2018.03.010

Effect of target current density on the structure and property of the Cr₂N films deposited by hot wire plasma enhanced magnetron sputtering

{{article.zuoZhe_EN}}

Author information +

History +

HeighLight

Abstract

Key words

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations

{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2018, 49(3): 3070-3075 https://doi.org/10.3969/j.issn.1001-9731.2018.03.010

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

Funding

RIGHTS & PERMISSIONS

PDF(3725 KB)

Accesses

Citation

Detail

Sections

Recommended

Received	Published
2017-05-31	2018-03-31
Issue Date
2018-03-31

Please choose a citation manager

Content to export

HeighLight

Abstract

Key words

Cite this article

{{custom_sec.title}}

{{custom_sec.title}}

References

References

{{custom_fnGroup.title_en}}

Footnotes

{{custom_ack.title_en}}

Funding

RIGHTS & PERMISSIONS