Effects of trimethylaluminium pulse duration and purging time on the performance of Al<sub>2</sub>O<sub>3</sub> film by atomic layer deposition

doi:10.3969/j.issn.1001-9731.2017.07.035

Jorunal of Functional Materials ›› 2017, Vol. 48 ›› Issue (7) : 7178-7181. DOI: 10.3969/j.issn.1001-9731.2017.07.035

Effects of trimethylaluminium pulse duration and purging time on the performance of Al₂O₃ film by atomic layer deposition

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2017, 48(7): 7178-7181 https://doi.org/10.3969/j.issn.1001-9731.2017.07.035

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2016-10-17	2017-07-30
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2017-07-30

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