Study on the Al doped Cu<sub>3</sub>N films prepared by magnetron sputtering

doi:10.3969/j.issn.1001-9731.2017.05.033

Jorunal of Functional Materials ›› 2017, Vol. 48 ›› Issue (5) : 5180-5184. DOI: 10.3969/j.issn.1001-9731.2017.05.033

Process & Technology

Study on the Al doped Cu₃N films prepared by magnetron sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2017, 48(5): 5180-5184 https://doi.org/10.3969/j.issn.1001-9731.2017.05.033

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Received	Published
2016-06-24	2017-05-30
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2017-05-30

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