Study on structure and properties of copper films deposited by DC pulsed magnetron sputtering

doi:10.3969/j.issn.1001-9731.2017.02.026

Jorunal of Functional Materials ›› 2017, Vol. 48 ›› Issue (2) : 2144-2148. DOI: 10.3969/j.issn.1001-9731.2017.02.026

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Study on structure and properties of copper films deposited by DC pulsed magnetron sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2017, 48(2): 2144-2148 https://doi.org/10.3969/j.issn.1001-9731.2017.02.026

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2016-03-10	2017-02-28
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2017-02-28

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