Effect of etching process on fast-epitaxial SiC thick films

doi:10.3969/j.issn.1001-9731.2017.01.024

Journal of Functional Materials ›› 2017, Vol. 48 ›› Issue (1) : 1139-1143. DOI: 10.3969/j.issn.1001-9731.2017.01.024

Research & Development

Effect of etching process on fast-epitaxial SiC thick films

{{article.zuoZhe_EN}}

Author information +

History +

HeighLight

Abstract

Key words

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations

{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2017, 48(1): 1139-1143 https://doi.org/10.3969/j.issn.1001-9731.2017.01.024

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

Funding

RIGHTS & PERMISSIONS

PDF(4901 KB)

Accesses

Citation

Detail

Sections

Recommended

Received	Published
2016-02-22	2017-01-30
Issue Date
2017-01-30

Please choose a citation manager

Content to export

HeighLight

Abstract

Key words

Cite this article

{{custom_sec.title}}

{{custom_sec.title}}

References

References

{{custom_fnGroup.title_en}}

Footnotes

{{custom_ack.title_en}}

Funding

RIGHTS & PERMISSIONS