Influence of oxidant concentration on 4H-SiC chemical mechanical polishing result

doi:10.3969/j.issn.1001-9731.2016.10.035

Journal of Functional Materials ›› 2016, Vol. 47 ›› Issue (10) : 10189-10192. DOI: 10.3969/j.issn.1001-9731.2016.10.035

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Influence of oxidant concentration on 4H-SiC chemical mechanical polishing result

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2016, 47(10): 10189-10192 https://doi.org/10.3969/j.issn.1001-9731.2016.10.035

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2015-09-06	2016-10-30
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2016-10-30

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