Preparation of monodispersed spherical silicon dioxide particles used as pattern transfer etching mask

doi:10.3969/j.issn.1001-9731.2016.05.040

Jorunal of Functional Materials ›› 2016, Vol. 47 ›› Issue (5) : 212-216. DOI: 10.3969/j.issn.1001-9731.2016.05.040

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Preparation of monodispersed spherical silicon dioxide particles used as pattern transfer etching mask

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2016, 47(5): 212-216 https://doi.org/10.3969/j.issn.1001-9731.2016.05.040

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2015-02-02	2016-05-30
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2016-05-30

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