Preparation of monodispersed spherical silicon dioxide particles used as pattern transfer etching mask

doi:10.3969/j.issn.1001-9731.2016.05.040

Journal of Functional Materials ›› 2016, Vol. 47 ›› Issue (5) : 212-216. DOI: 10.3969/j.issn.1001-9731.2016.05.040

Process & Technology

Preparation of monodispersed spherical silicon dioxide particles used as pattern transfer etching mask

{{article.zuoZhe_EN}}

Author information +

History +

HeighLight

Abstract

Key words

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations

{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2016, 47(5): 212-216 https://doi.org/10.3969/j.issn.1001-9731.2016.05.040

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

Funding

RIGHTS & PERMISSIONS

PDF(1416 KB)

Accesses

Citation

Detail

Sections

Recommended

Received	Published
2015-02-02	2016-05-30
Issue Date
2016-05-30

Please choose a citation manager

Content to export

HeighLight

Abstract

Key words

Cite this article

{{custom_sec.title}}

{{custom_sec.title}}

References

References

{{custom_fnGroup.title_en}}

Footnotes

{{custom_ack.title_en}}

Funding

RIGHTS & PERMISSIONS