Effect of chemical mechanical planarization material on sapphire polishing rate and roughness

JIA Shaohua, LIU Yuling, WANG Chenwei, YAN Chenqi

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Jorunal of Functional Materials ›› 2016, Vol. 47 ›› Issue (2) : 2242-2246. DOI: 10.3969/j.issn.1001-9731.2016.02.047
Process & Technology

Effect of chemical mechanical planarization material on sapphire polishing rate and roughness

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{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2016, 47(2): 2242-2246 https://doi.org/10.3969/j.issn.1001-9731.2016.02.047

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