磁控溅射本底真空度对制备高锰硅的形貌影响
潘王衡, 张晋敏, 谢杰, 冯磊, 贺腾, 王立, 肖清泉, 谢泉
Effect of background vacuum on the morphology of higher manganese silicide prepared by magnetron sputtering
PAN Wangheng, ZHANG Jinmin, XIE Jie, FENG Lei, HE Teng, WANG Li, XIAO Qingquan, XIE Quan
功能材料
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2020, (8): 8183
-8188
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DOI: 10.3969/j.issn.1001-9731.2020.08.029
