靶电流密度对热丝增强等离子磁控溅射制备Cr2N薄膜结构与性能的影响
张鑫, 王晓明, 高健波, 郭媛媛, 解志文, 周艳文
Effect of target current density on the structure and property of the Cr2N films deposited by hot wire plasma enhanced magnetron sputtering
ZHANG Xin, WANG Xiaoming, GAO Jianbo, GUO Yuanyuan, XIE Zhiwen, ZHOU Yanwen
功能材料
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2018, (3): 3070
-3075
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DOI: 10.3969/j.issn.1001-9731.2018.03.010
