工艺气体比例对微波MOCVD沉积氧化铝膜性能影响
张健,巴德纯,赵崇凌,杜广煜,刘坤
Influenec of process gas ratio on the properties of alumina film deposited by microwave mocvd thchnology
ZHANG Jian, BA Dechun, ZHAO Chongling,DU Guangyu,LIU Kun
功能材料
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2016, (5): 227
-230
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DOI: 10.3969/j.issn.1001-9731.2016.05.043
