刻蚀转移掩蔽膜用单分散SiO2纳米小球制备
王影,王权岱,肖继明,王莉,李鹏阳
Preparation of monodispersed spherical silicon dioxide particles used as pattern transfer etching mask
WANG Ying, WANG Quandai, XIAO Jiming, WANG Li, LI Pengyang
功能材料
.
2016, (5): 212
-216
.
DOI: 10.3969/j.issn.1001-9731.2016.05.040
