用于铜互连的Ta/Ti-Al集成薄膜的结构和阻挡性能
任国强;邢金柱;李晓红
Microstructure and barrier performance of Ta/Ti-Al integrated film used as a barrier layer for Cu metallization
Guo-Qiang Ren;Jin-Zhu Xing;Xiao-Hong Li
. 2012, (04): 462 -464 .