用于铜互连的Ta/Ti-Al集成薄膜的结构和阻挡性能
任国强;邢金柱;李晓红
用于铜互连的Ta/Ti-Al集成薄膜的结构和阻挡性能
Microstructure and barrier performance of Ta/Ti-Al integrated film used as a barrier layer for Cu metallization
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