TMA脉冲和吹扫时间对原子层沉积的氧化铝薄膜的影响
李春亚, 张浩, 宋建涛, 丁星伟, 魏斌
Effects of trimethylaluminium pulse duration and purging time on the performance of Al2O3 film by atomic layer deposition
LI Chunya, ZHANG Hao, SONG Jiantao, DING Xingwei, WEI Bin
功能材料
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2017, (7): 7178
-7181
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DOI: 10.3969/j.issn.1001-9731.2017.07.035
