
氢气气氛退火处理温度对磁控溅射ZnO薄膜光电性能的影响
周明
氢气气氛退火处理温度对磁控溅射ZnO薄膜光电性能的影响
Influence of hydrogen annealing temperature on the optical and electrical properties of ZnO thin films prepared by magnetron sputtering
{{custom_ref.label}} |
{{custom_citation.content}}
{{custom_citation.annotation}}
|
/
〈 |
|
〉 |