靶基距对射频磁控溅射法制备氟碳膜的结构与性能影响
刘增机;纪全;张浴晖;夏延致;王凤军;
靶基距对射频磁控溅射法制备氟碳膜的结构与性能影响
The study on structure and properties of fluorocarbon films prepared by RF magnetron sputtering at varying target-substrate distance
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