LI Chunwei;GONG Chunzhi;WU Zhongzhen
. 2012, 43(14): 1922-1926.
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Vanadium oxide films were fabricated using High Power Pulsed Magnetron discharge plasma ion implantation and deposition technique (HPPMS-PIID), influence of amplitudes of high voltage on phase structure,surface morphology,cross-sectional morphology,and corrosion resistance of vanadium oxide films has been investigated by X-ray diffraction(XRD),atomic force microscopy(AFM),scanning electron microscopy(SEM),and electrochemical tester respectively. XRD showed mainly VO2(111),also contained a small amount of VO2 ( 111), VO ( 220), VO ( 222) phase.Vanadium oxide films surface were relatively dense and smooth under different high voltages, whose surface roughness were only a few nanometers, which showed good surface quality; vanadium oxide films all represent typical of the density of the columnar crstal growth outlook, vanadium oxide films thickness declined with high voltages. Corrosion resistance of vanadium oxide films improved greatly than pure aluminum, vanadium oxide films corrosion potential was supreme and the corrosion potential increases by 0.093V, but the corrosion current decreases by an order of magnitude; corrosion current was minimum at 15kV, which showed the best corrosion resistance.