Controlled preparation, characterization and optimizing technology of uniform films at wafer scale

doi:10.3969/j.issn.1001-9731.2026.05.010

Journal of Functional Materials ›› 2026, Vol. 57 ›› Issue (5) : 76-87. DOI: 10.3969/j.issn.1001-9731.2026.05.010

Review & Advance

{{article.zuoZhe_EN}}

Author information +

History +

HeighLight

Abstract

Key words

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations

{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2026, 57(5): 76-87 https://doi.org/10.3969/j.issn.1001-9731.2026.05.010

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

Funding

RIGHTS & PERMISSIONS

PDF(11078 KB)

Accesses

Citation

Detail

Sections

Recommended

Received	Revised
2025-07-12	2025-10-22
Issue Date
2026-06-04

Please choose a citation manager

Content to export

HeighLight

Abstract

Key words

Cite this article

{{custom_sec.title}}

{{custom_sec.title}}

References

References

{{custom_fnGroup.title_en}}

Footnotes

{{custom_ack.title_en}}

Funding

RIGHTS & PERMISSIONS